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K-PURE TAG-2678

  • Chemistry Quarternary ammonium blocked super acid catalyst
  • Application Advantage Low trace metals
  • Formulation Advantage No volatile by-products after activation
  • Thermal acid generator A quaternary ammonium blocked triflic acid thermal acid generator specifically designed for use in thermally cured microlithography coatings.

NA-LUBE KR-006FG

  • Viscosity @ 100°C 5.6 cSt
  • Pour Point -33°C
  • Application Advantage FDA 21 CFR HX-1
  • Alkylated naphthalene Low viscosity, FDA 21 CFR HX-1 compliant.

NA-LUBE KR-008

  • Viscosity @ 100°C 5.6 cSt
  • Noack Volatility 12 wt%
  • Pour Point 33°C
  • Alkylated naphthalene Low viscosity alkylated naphthalene offering outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

NA-LUBE KR-015

  • Viscosity @ 100°C 13.5 cSt
  • Noack Volatility 2.2 wt%
  • Pour Point -39°C
  • Alkylated naphthalene Medium viscosity alkylated naphthalene offering outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

NA-LUBE KR-015FG

  • Viscosity @ 100°C 13.1 cSt
  • Noack Volatility 2.2 wt%
  • Pour Point -46.5°C
  • Alkylated naphthalene Medium viscosity, FDA 21 CFR HX-1 compliant alkylated naphthalene. Offers outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

NA-LUBE KR-019

  • Viscosity @ 100°C 18.7 cSt
  • Noack Volatility 1.4 wt%
  • Pour Point -26°C
  • Alkylated naphthalene Higher viscosity alkylated naphthalene offering outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

NA-LUBE KR-023

  • Viscosity @ 100°C 19.8 cSt
  • Pour Point -21°C
  • Formulation Advantage Low volatility
  • Alkylated naphthalene Highest viscosity alkylated naphthalene offering outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

NA-LUBE KR-029FG

  • Viscosity @ 100°C 18.7 cSt
  • Noack Volatility 1.4 wt%
  • Pour Point -26°C
  • Alkylated naphthalene Higher viscosity FDA 21 CFR HX-1 compliant alkylated naphthalene offering outstanding solubility plus excellent hydrolytic and thermo-oxidative stability.

DISPARLON 6300

  • Market Application Epoxies
  • Formulation Advantage Heat stability
  • Formulation Advantage Low activation temperature
  • Rheology modifier Hybrid powdered polyamide thixotropic agent requiring a low activation temperature for excellent anti-sag. Especially effective in epoxy coatings and adhesives.

DISPARLON 6500

  • Application Advantage Non-seeding
  • Application Advantage Anti-sag
  • Application Advantage Shear thinning
  • Rheology modifier Versatile powdered polyamide thixotropic agent excellent anti-sag in coatings, sealants and adhesive formualations.

DISPARLON 6650

  • Market Application Epoxies
  • Application Advantage Anti-sag
  • Formulation Advantage Cost effective
  • Rheology modifier Cost effective powder polyamide based thixotrope that imparts excellent anti-sag properties and recoatability to coatings.

DISPARLON 6700

  • Market Application Heavy duty paints
  • Application Advantage Recoatability
  • Formulation Advantage Efficient
  • Rheology modifier Highly efficient powder polyamide thixotrope that imparts excellent anti-sag properties to coatings. Especially suited for high build epoxies.

DISPARLON A650-20X

  • Application Advantage High build films
  • Application Advantage Anti-sag
  • Formulation Advantage Efficient
  • Rheology modifier Pre-activated polyamide thixotrope, best for high build epoxy systems.

K-FLEX UD-350W

  • Viscosity @ 25°C 4,000 cPs
  • % Active 88
  • Hydroxyl Number 300
  • Urethane diol High solids, low viscosity aqueous urethane diol resin that increases hardness and provides improved resistance properties in WB/ WR 2-component polyurethane

K-PURE CDR-3315

  • Chemistry Ester diol
  • Application Advantage Flexibility
  • Application Advantage Adhesion promotion
  • Resin modifier Modifier for aminoplast, isocyanate and cationically cured epoxies.

K-PURE TAG-2689

  • Chemistry Quarternary ammonium blocked super acid catalyst
  • Application Advantage Low trace metals
  • Formulation Advantage No volatile by-products after activation
  • Thermal acid generator A quaternary ammonium blocked triflic acid thermal acid generator specifically designed for use in thermally cured microlithography coatings.
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